Capabilities

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The 13,500 sq. ft. Lurie Nanofabrication Facility (LNF) offers complete fabrication and characterization capabilities for research on a wide range of material structures, devices and systems.

Comprehensive patterning and micro/nanofabrication technologies are available for surface and bulk micromachining, optical and e-beam lithography, reactive ion etching including DRIE, direct write and printing techniques, thin-film deposition, chemical vapor deposition, oxidation/ doping/ diffusion, lapping/polishing, electroplating, wafer bonding. Most equipment can handle samples from small pieces to 150mm diameter wafers.

The facility provides the user community with the flexibility to work with many different materials for quantum devices, nanophotonics, advanced electronic devices and circuits, organic electronic, microfluidics, MEMS and integrated microsystems. 

Eighteen technical staff members support the LNF facilities, programs and user community, and provide expertise in e-beam lithography, wafer bonding, chemical vapor deposition, process integration, microfluidics, soft lithography, plasma etching, DRIE and advanced material and structure characterization. This includes Ph.D. staff members who have experience in nanofabrication, MEMS and integrated microsystems, photonics, surface science and nanomaterials, and whose primary function is to assist and support the user community with their research projects. The LNF also includes office, general computing and collaboration space for use by external users when they are onsite. External users have access to the necessary support (storage, local housing, transportation assistance etc) that they need outside of LNF.